Beams Document 3906-v1

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Towards Chip and Wafer Scale High Energy Charged Particle Sources

Document #:
Beams-doc-3906-v1
Document type:
Talk
Submitted by:
Robert M Zwaska
Updated by:
Robert M Zwaska
Document Created:
18 Jul 2011, 16:44
Contents Revised:
18 Jul 2011, 16:44
Metadata Revised:
18 Jul 2011, 16:44
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Abstract:
This talk will present recent results on microfabricated lateral electric field guides for guiding and accelerating argon ion beams. The scaling of gaps using lithography favors the use of electric fields to guide charged particles, instead of magnetic fields. This scaling, coupled with high frequency integrated electronics, can potentially eliminate the need for permanent magnets enabling ultra miniaturized high energy beam sources. Ar+ ions of ~2keV are shown to be guided and bent along a curved path to realize a 90° turn, in silicon micro-fabricated channels of radius 1-mm and 2mm respectively and on printed circuit boards of 4-mm radius. The lateral field guides can be used to guide charged particles for energy analysis or acceleration. Chip-scale ion acceleration and deceleration, of up to 30eV, is also demonstrated with the use of longitudinal electrical fields. These results pave the way for further integration of accelerator miniaturization for reducing the size of SEMs, gas analyzers, and x-ray sources.

(Accelerator Physics & Technology Seminar)

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