Beams Document 4381-v1

DocDB Home ]  [ Search ] [ Last 20 Days ] [ List Authors ] [ List Topics ] [ List Events ]

Status of the New MI and RR Beam Profiling Measurement Devices

Document #:
Document type:
Submitted by:
Randy M Thurman-Keup
Updated by:
Randy M Thurman-Keup
Document Created:
11 Jun 2013, 12:13
Contents Revised:
11 Jun 2013, 12:13
Metadata Revised:
11 Jun 2013, 12:13
Viewable by:
  • Public document
Modifiable by:

Quick Links:
Latest Version

Other Versions:
11 Jun 2013, 15:26
We have undertaken the design of our next generation Ionization Profile Monitor to incorporate a physically smaller 3 bump magnetic containment field, a system for gating the clearing field to select particles from a single batch, an upgraded tunnel preamp, and 16 bit data acquisition system. The desired end result is to still be able to accomplish turn by turn measurements, and extend MicroChannel Plate lifetime. We will present an overview of the new design together with a study of the drift patterns of ionization particles in the active volume of the new IPMs. We also present plans, simulations, and some studies of an electron beam scanner currently being constructed for the Main Injector.
Files in Document:
DocDB Home ]  [ Search ] [ Last 20 Days ] [ List Authors ] [ List Topics ] [ List Events ]

DocDB Version 8.8.10, contact Beams Document Database Administrators